At the heart of advancing semiconductor chip technology lies a critical challenge: creating smaller, more efficient electronic components. This challenge is particularly evident in the field of ...

Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error. VSB shot configurations and its corresponding ...

(Nanowerk News) Recently, researchers from the Shanghai Institute of Optics and Fine Mechanics (SIOM) of the Chinese Academy of Sciences (CAS) have proposed a source mask optimization (SMO) technique ...

Photolithography involves the selective exposure of a photosensitive material to light, using a UV light source and a collimating optical system to create an image of a patterned mask onto a substrate ...

The semiconductor industry is making noticeable progress on the development of advanced curvilinear photomasks, a technology that has broad implications for chip designs at the most advanced nodes and ...